Dual-Beam Scanning Electron Microscope with a Plasma Ion Beam (Plasma-FIB/SEM)

Specifications:

  • High ion beam currents for high ablation rates
  • Wide range of motion for the stage
  • Comprehensive analysis combinable with ion beam processing
  • Preparation suitable for analysis using various available ions
  • 379 mm wide chamber with a 5-axis table
  • Travel range xyz: 110 mm × 110 mm × 65 mm
  • Tilt angle: -38° to 90°
  • Continuous rotation: 360°
  • Precise preparation of lamellae for transmission electron microscopy, atomic probe needles, micropillars, and much more
  • Coating and bonding using the MultiChem gas injection system (Pt, C, Dx)
  • Removal of material regions using an ion beam

Nanomanipulator

  • Nanoindentation and mechanical testing at the micrometer scale

Energy-Dispersive X-ray Spectroscopy (EDX)

  • Qualitative and quantitative chemical analysis

Electron Backscatter Diffraction (EBSD)

  • Crystallographic orientation mapping of microstructures, including in 3D

Time-of-flight secondary ion mass spectrometry (ToF-SIMS)

  • Ultra-high-resolution and highly sensitive chemical analysis

(In-lens) secondary and backscattered electron detectors (SE/BSE)

  • High-resolution imaging of surface topographies and atomic contrast

Scanning Transmission Electron Microscopy (STEM)

  • Highest-resolution imaging of electron-transparent samples

Acknowledgments:

The dual-beam scanning electron microscope with a plasma ion beam was funded by the German Research Foundation (DFG) (Project No. 546742436) and the European Regional Development Fund of the State of Hesse.